Changzhou waston chemical technology
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Photoresist Chemicals
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2-Propenoic acid, 1-ethylcyclohexyl ester
2-Propenoic acid, 1-ethylcyclohexyl ester
ECHA
CAS: 251909-25-8
MF: C11H18O2
MW: 182.26
Purity:GC/LC≥99%
Appearance:transparent liquid
Package:5L 10L 25L Drum
Stable with MEHQ 200-400PPM